Patent Title | SEMICONDUCTOR DEVICE- A Low Cost and High Performance High-side NLDMOS Using N-buried Layer (NBL) and Lateral Linear Graded Doping Profile of N-drift Region |
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Patent Country | 美國 |
Publish Date | 2016/04/07 |
Authors | Lin Yongzhang(林詠章) |
Note | (01)楊紹明,(02)許健 |